레이저 유도 열화학 습식에칭을 이용한 티타늄 미세구조물 제조

Laser-induced Thermochemical Wet Etching of Titanium for Fabrication of Microstructures

  • 신용산 (광주과학기술원 대학원 기전공학과) ;
  • 손승우 (광주과학기술원 대학원 기전공학과) ;
  • 정성호 (광주과학기술원 기전공학과)
  • 발행 : 2004.04.01

초록

Laser-induced thermochemical wet etching of titanium in phosphoric acid has been investigated to examine the feasibility of this method fur fabrication of microstructures. Cutting, drilling, and milling of titanium foil were carried out while examining the influence of process parameters on etch width, etch depth, and edge straightness. Laser power, scanning speed of workpiece, and etchant concentration were chosen as major process parameters influencing on temperature distribution and reaction rate. Etch width increased almost linearly with laser power showing little dependence on scanning speed while etch depth showed wide variation with both laser power and scanning speed. A well-defined etch profile with good surface quality was obtained at high concentration condition. Fabrication of a hole, micro cantilever beam, and rectangular slot with dimension of tess than 100${\mu}{\textrm}{m}$ has been demonstrated.

키워드

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