Journal of the Korean Ceramic Society (한국세라믹학회지)

The Korean Ceramic Society (한국세라믹학회)
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Effect of Pulse Frequency on the Properties of ZnO:Al Thin Films Prepared by Pulsed DC Magnetron Sputtering

펄스 DC 마그네트론 스퍼터링법에 의한 ZnO:Al 박막 증착시 펄스 주파수의 영향

  • 고형덕 (성균관대학교 정보통신용 신기능성 소재 및 공정연구센터) ;
  • 이충선 (아주대학교 물리학) ;
  • 태원필 (인하대학교 소재연구) ;
  • 서수정 (성균관대학교 정보통신용 신기능성 소재 및 공정연구센) ;
  • 김용성 (성균관대학교 정보통신용 신기능성 소재 및 공정연구센터)
  • Published : 2004.06.01
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Abstract

AZO (Al-doped ZnO) thin films were deposited on glass by pulsed magnetron sputtering method, and their structural, electrical and optical properties were investigated. XRD patterns showed that a highly c-axis preferred AZO film was grown in perpendicular to the substrate when pulse frequency of 30 ㎑ was applied to the target. Microstructure of thin films showed that the fibrous grain of tight dome shape was grown. The deposition rate decreased linearly with increase of pulse frequency, and the lowest resistivity was 8.67${\times}$10$\^$-4/ $\Omega$-cm for the film prepared at pulse frequency of 30 ㎑. The optical transmittance spectra of the films showed a very high transmittance of 85∼90%, within visible wavelength region and exhibited the absorption edge of about 350 nm. The characteristics of the low electrical resistivity and high optical transmittance of AXO films suggested a possibility for the application to transparent conducting oxides.

펄스 do 마그네트론 스퍼터링법에 의해 유리 기판 위에 AZO(Al-doped ZnO) 박막을 제조하여 박막의 구조적, 전기적 및 광학적 특성을 조사하였다. 본 연구를 위해 l.0 at% Al이 도핑 된 ZnO세라믹 타켓을 사용하였다. XRD 분석을 통하여 30KHz의 펄스 주파수가 인가되었을 때 c축 배향성이 가장 우수하게 나타났고, 표면 형상 분석을 통하여 매우 치밀한 박막이 성장되었음을 알 수 있었다. 증착율은 펄스 주파수가 증가함에 따라 선형적으로 감소하였고, 30KHz의 펼스 주파수가 인가되었을 때 비저항은 8.67${\times}$$10^{-4}$ $\Omega$-cm의 가장 낮은 비저항을 나타내었으며, UV-vis. 투과율 측정결과, 평균 85% 이상의 높은 투과도를 나타내었다. 이러한 낮은 비저항 및 높은 광 투과도로 볼 때 AZO 박막은 투명 전도성 산화물 박막으로의 응용 가능성을 나타내었다.

Keywords

References

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