Transactions of the Korean Society of Mechanical Engineers A (대한기계학회논문집A)

The Korean Society of Mechanical Engineers (대한기계학회)
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Nanoscale Patterning Using Femtosecond Laser and Self-assembled Monolayers (SAMs)

펨토초레이저와 자기조립박막을 이용한 나노스케일 패터닝

  • 장원석 (한국기계연구원 나노공정그룹) ;
  • 최무진 (한국기계연구원 나노공정그룹) ;
  • 김재구 (한국기계연구원 나노공정그룹) ;
  • 조성학 (한국기계연구원 나노공정그룹) ;
  • 황경현 (한국기계연구원)
  • Published : 2004.09.01
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Abstract

Standard positive photoresist techniques were adapted to generate nano-scale patterns of gold substrate using self-assembled monolayers (SAMs) and femtosecond laser. SAMs formed by the adsorption of alkanethiols onto gold substrate are employed as very thin photoresists, Alkanethiolates formed by the adsorption of alkanethiols are oxidized on exposure to UV light in the presence of air to alkylsulfonates. Specifically, it is known that deep UV light of wavelength less than 200nm is necessary for oxidation to occur. In this study, ultrafast laser of wavelength 800nm and pulse width 200fs is applied for photolithography. Results show that ultrafast laser of visible range wavelength can replace deep UV laser source for photo patterning using thin organic films. Femtosecond laser coupled near-field scanning optical microscopy facilitates not only the patterning of surface chemical structure, but also the creation of three-dimensional nano-scale structures by combination with suitable etching methods.

Keywords

References

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