DOI QR코드

DOI QR Code

Dielectric Surface Treatment Effects on Organic Thin-film Transistors

유기반도체 트랜지스터의 유전체 표면처리 효과

  • Lim Sang Chul (Electronics and Telecommunications Research Institute, Department of Materials Science It Engineering, Chungnam National University) ;
  • Kim Seong Hyun (Electronics and Telecommunications Research Institute) ;
  • Lee Jung Hun (Electronics and Telecommunications Research Institute, Information Display Department, Hyung Hee University) ;
  • Ku Chan Hoe (Electronics and Telecommunications Research Institute, Information Display Department, Hyung Hee University) ;
  • Kim Dojin (Department of Materials Science It Engineering, Chungnam National University) ;
  • Zyung Taehyong (Electronics and Telecommunications Research Institute)
  • 임상철 (한국전자통신연구원 미래기술연구본부, 충남대학교 재료공학과) ;
  • 김성현 (한국전자통신연구원 미래기술연구본부) ;
  • 이정헌 (한국전자통신연구원 미래기술연구본부, 경희대학교 디스플레이공학과) ;
  • 구찬회 (한국전자통신연구원 미래기술연구본부, 경희대학교 디스플레이공학과) ;
  • 김도진 (충남대학교 재료공학과) ;
  • 정태형 (한국전자통신연구원 미래기술연구본부)
  • Published : 2005.03.01

Abstract

The surface states of gate dielectrics affect device performance severely in Pentacene OTFTs. We have fabricated organic thin-film transistors (OTFTs) using pentacene as an active layer with chemically modified $SiO_2$ gate dielectrics. The effects of the surface treatment of $SiO_2$ on the electric characteristics of OTFTS were investigated. The surface of $SiO_2$ gate dielectric was treated by normal wet cleaning process, $O_2-plasma$ treatment, hexamethyldisilazane (HMDS), and octadecyltrichlorosilane (OTS) treatment. After the surface treatments, the contact angles and surface free energies were measured in order to analyze the surface state changes. In the electrical measurements, typical I-V characteristics of TFTs were observed. The field effect mobility, $\mu$, was calculated to be $0.29\;cm^2V^{-1}s^{-1}$ for OTS treated sample while those for the HMDS, $O_2$ plasma treated, and wet-cleaned samples were 0.16, 0.1, and $0.04\;cm^2V^{-1}s^{-1}$, respectively.

Keywords

References

  1. H. Klauk, D. J. Gundlach, J. A. Nicoles, C. D. Sheraw, M. Bonse and T. N. Jackson, Solid State Technol., 43, 63 (2000)
  2. M. Shtein, J. Mapel, J. B. Benziger and S. R. Forrest, Appl. Phys. Lett., 81, 268 (2002) https://doi.org/10.1063/1.1491009
  3. D. Knipp, R. A. Street, B. Krusor, A. Volkel and J. Ho, J. Appl. Phys., 93, 347 (2003) https://doi.org/10.1063/1.1525068
  4. A. Salleo, M. L. Chabinyc, M. S. Yang and R. A. Street, Appl. Phys., 81, 23 (2002)
  5. A. R. Brown, C. P. Jarret, D. M. de Leeuw and M. Matters, 'Field-effect transistors made from solution processed organic semiconductors' Synth. Met., 88, 37 (1997) https://doi.org/10.1016/S0379-6779(97)80881-8
  6. Y. Lin, D. J. Gundlach, S. F. Nelson and T. N. Jackson, 'Stacked pentacene layer organic thin-film transistors with improved characteristics' IEEE Elect. Dev. Lett., 18, 606, (1997) https://doi.org/10.1109/55.644085
  7. C. D. Dimitrakopoulos, A. R. Brown and A. Pomp, 'Molecular beam deposited thin films of pentacene for organic filed effect transistor applications' J. Appl. Phys., 80, 2501, (1996) https://doi.org/10.1063/1.363032
  8. R.H. Tredgold, Order in Thin Organic Films, Cambridge University Press, (1994)
  9. A. Ulman, An Introduction to Ultrathin Organic Films: From Langmuir-Blodgett to Self-Assembly, Academic press, New York, (1991)
  10. T. Young, Philos. R. Soc. Lond., 95, 65 (1805) https://doi.org/10.1098/rstl.1805.0005
  11. Fowkes, F. M., 1964, 'Attractive Forces at Interfaces,' Ind. and Eng. Chem., Vol. 56, pp. 40-52 https://doi.org/10.1021/ie50660a008
  12. D. K, Owens and R. C. Wendt, J. Appl. Polym. Sci., 13, 1741 (1969) https://doi.org/10.1002/app.1969.070130815
  13. D. H. Kaelble, J. Adhes., 2, 50 (1970) https://doi.org/10.1080/0021846708544579
  14. S. Wu, J. Polym. Sci, Part C 34, 19 (1971) https://doi.org/10.1002/polc.5070340105
  15. R. F. Gould (Ed.), Contact Angle, Wettability and Adhesion, Proceeding of the 144th Meeting of the American Chemical Society, Vol 43, Washington D. C. (1964)
  16. R. J. Good, Contact angle wetting and adhesion: A critical review, in: K. L. Mimal (Ed.), Contact angle, Wettability and Adhesion, USP, The Netherlands, 3-36 (1993)
  17. H. Klauk, D. J. Gundlach, J. A. Nichols, C. D. Sheraw, M. Bonse, T. N. Jackson, Solid State Technol. 43, 63 (2000)
  18. K-X. Ma, C.-H. Ho, F. Zhu and T.-S. Chung, Thin Solid Films, 371, 140-147 (2000) https://doi.org/10.1016/S0040-6090(00)00994-9
  19. Dan Lu, Ying Wu, Jianhua Guo, Guang Lu, Yue Wang, Jiacong Shen, 'Surface treatment of indium tin oxide by oxygen-plasma for organic light-emitting diodes', Materials Science and Engineering, Vol. B97, pp.141-144, 2003 https://doi.org/10.1016/S0921-5107(02)00435-X
  20. X. Li and K. Horita, Carbon, 38, 133 (2000) https://doi.org/10.1016/S0008-6223(99)00108-6
  21. M. Nakahara, K. Ozawa and Y. Sanada, J. Mater Sci., 29 1646 (1994) https://doi.org/10.1007/BF00368939