Transactions on Electrical and Electronic Materials

The Korean Institute of Electrical and Electronic Material Engineers (한국전기전자재료학회)
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Vertical Alignment of Nematic Liquid Crystal on the SiC Thin Film Layer with Ion-beam Irradiation

  • Oh, Yong-Cheul (Department of Electrical Engineering, Kwangwoon University) ;
  • Lee, Dong-Gyu (Department of Electrical Engineering, Kwangwoon University)
  • Published : 2006.12.30
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Abstract

We studied the nematic liquid crystal (NLC) aligning capabilities using the new alignment material of the SiC (Silicon Carbide) thin film. The SiC thin film exhibits good chemical and thermal stability. The good thermal and chemical stability make SiC an attractive candidate for electronic applications. A vertical alignment of nematic liquid crystal by atomic beam exposure on the SiC thin film surface was achieved. The about $87^{\circ}$ of stable pretilt angle was achieved at the range from $30^{\circ}\;to\;45^{\circ}$ of incident angle. Consequently, the vertical alignment effect of liquid crystal electro-optical characteristic by the atomic beam alignment method on the SiC thin film layer can be achieved.

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References

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