한국광학회지 (Korean Journal of Optics and Photonics)

  • 제18권5호
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  • Pages.303-308
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  • 2007
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  • 1225-6285(pISSN)
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  • 2287-321X(eISSN)
한국광학회 (Optical Society of Korea)
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디지털 홀로그램 현미경을 이용한 위상차 포토마스크 결함 측정

Defect Inspection of Phase Shift Photo-Mask with Digital Hologram Microscope

  • 발행 : 2007.10.25
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초록

디지털 홀로그래피 현미경을 이용하여 반도체 공정에 사용되는 위상차 포토마스크의 결함을 측정하였다. 이러한 위상차 포토마스크는 위상차를 이용하여 반도체 문양을 만들기 때문에 일반 현미경으로는 패턴을 알 수 없을 뿐 아니라 위상마스크의 결함은 더욱더 찾기 어렵다. 디지털 홀로그래피 현미경을 이용하면 한 장의 홀로그램을 이용하여 위상차 포토마스크의 3차원 구조와 결함을 동시에 측정할 수 있다.

We report here on the application of a digital holographic microscope as a metrology tool for the inspection and the micro-topography reconstruction of different micro-structures of phase shift photo-mask (PSM). The lithography by phase shift photo-mask uses the interference and the pattern of the PSM is not imaged by general optical microscope. The technique allows us to obtain digitally a high-fidelity surface topography description of the phase shift photo-mask with only one hologram image acquisition, allowing us to have relatively simple and compact set-ups able to give quantitative information of PSM.

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참고문헌

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