한국정밀공학회지 (Journal of the Korean Society for Precision Engineering)

  • 제25권3호
  • /
  • Pages.7-14
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  • 2008
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  • 1225-9071(pISSN)
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  • 2287-8769(eISSN)
한국정밀공학회 (Korean Society for Precision Engineering)
권호 표지

전자빔 응용 나노 가공기술

Nano-machining Technology Using Electron Beam

  • 김재구 (한국기계연구원 나노기계연구본부) ;
  • 이재종 (한국기계연구원 나노기계연구본부) ;
  • 조성학 (한국기계연구원 나노기계연구본부) ;
  • 최두선 (한국기계연구원 나노기계연구본부) ;
  • 이응숙 (한국기계연구원 나노기계연구본부)
  • 발행 : 2008.03.01
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초록

키워드

참고문헌

  1. Madou, M. J., "Fundamentals of microfabrication," 2nd Ed., CRC press, pp. 53-57, 2001
  2. 이재종, 장원석, "나노스케일 3D형상 패터닝 기술," 물리학과 첨단기술, 제13권 10호, pp.14-19, 2004
  3. Kim, S. T., Yang D. S., Park, H. W. and Kim, T. H., "Technology of semiconductor industry and development of photoresist," Polymer Science and Technology, Vol. 16, No. 1, 2005
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  5. Wang, X., Hu, W., Ramasubramaniam, R., Bernstein, G. H., Snider, G. and Lieberman, M., "Formation, Characterization, and Sub-50-nm Patterning of Organosilane Monolayers with Embedded Disulfide Bonds: An Engineered Self-Assembled Monolayer Resist for Electron-Beam Lithography," Langmuir, Vol. 19, pp. 9748-9758, 2003 https://doi.org/10.1021/la035291e
  6. Lee, J. J., "Development of key technologies for nanoscale shape fabrication-Research report," KOCI, 2006
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  8. Ishii, Y. and Taniguchi, J., "Fabrication of three-dimensional nanoimprint mold using inorganic resist in low accelerating voltage electron beam lithography," Microelectronic engineering, Vol. 84, pp. 912-915, 2007 https://doi.org/10.1016/j.mee.2007.01.133
  9. KISTI, "Nanotechnology policy brief," KISTI, No. 4, pp. 1-36, 2007
  10. Kim, H. S., Kim, Y. C., Kim, D. W., Ahn, S. J., Jang, Y., Kim, H. W., Seong, D. J., Park, K. W., Park, S. S. And Kim, B. J., "Low energy electron beam microcolumn lithography," Microelectronic Engineering, Vol. 83, pp. 962-967, 2006 https://doi.org/10.1016/j.mee.2006.01.099
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  12. http://www.mapperlithography.com/
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