A Development on the Non-Photomask Plate Making Technology for Screen Printing (III)

포토마스크가 필요 없는 스크린 제판 기술 개발(III)

  • Kang, Hyo-Jin (Department of Graphic Arts Engineering, Graduate School, Pukyoung National University) ;
  • Park, Kyoung-Jin (Department of Graphic Arts Engineering, Graduate School, Pukyoung National University) ;
  • Kim, Sung-Bin (Division of Image & Information, College of Engineering, Pukyong National University) ;
  • Nam, Su-Yong (Division of Image & Information, College of Engineering, Pukyong National University) ;
  • Ahn, Byung-Hyun (Department of Metallurgical Engineering, Pukyong National University)
  • 강효진 (부경대학교 대학원 인쇄공학과) ;
  • 박경진 (부경대학교 대학원 인쇄공학과) ;
  • 김성빈 (부경대학교 공과대학 화상정보공학부) ;
  • 남수용 (부경대학교 공과대학 화상정보공학부) ;
  • 안병현 (부경대학교 공과대학 신소재 공학부)
  • Published : 2008.12.01

Abstract

We designed a UV-LED exposure system which has 365nm dominant wavelength due to the environment-friendly and economical maskless screen plate making. And the photoresist applied on the screen stretched was exposed without mask by beam projector with UV-LED light source. Then it was developed by air spray with $1.7\;kgf/cm^2$ of injection pressure. The pencil hardness and solvent resistance of curing photoresist film were excellent as those of conventional photoresist film and the maximum resolution of line image formed by maskless screen plate making. was $100{\mu}m$, so we could establish the possibility of environment-friendly maskless screen plate making technology. But the sharpness of the patterns were ${\pm}40{\mu}m$ since the exposure system for maskless plate making has weak light intensity and the diffusion of light.

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