한국전기전자재료학회논문지 (Journal of the Korean Institute of Electrical and Electronic Material Engineers)

  • 제21권9호
  • /
  • Pages.789-794
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  • 2008
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  • 1226-7945(pISSN)
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  • 2288-3258(eISSN)
한국전기전자재료학회 (The Korean Institute of Electrical and Electronic Material Engineers)
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RF-Sputtering 법을 이용한 ZnO:Al 박막의 후 열처리에 따른 특성 변화

Effects of Post Annealing on the Properties of ZnO:Al Films Deposited by RF-Sputtering

  • 이재형 (군산대학교 전자정보공학부) ;
  • 이동진 (군산대학교 전자정보공학부)
  • 발행 : 2008.09.01
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초록

Zinc oxide (ZnO) has been widely studied for its practical applications such as transparent conduction electrodes for flat panel displays and solar cells. Especially, ZnO films show good chemical stability against hydrogen plasma, absence of toxicity, abundance in nature, and then suitable for photovoltaic applications. However, the fabrication process of thin film solar cells require a high substrate temperature and/or post heat treatment. Therefore, the layers have to withstand high temperatures, requiring an excellent stability without degrading their electronic and optical properties. In this paper, we investigated the stability of zinc oxide (ZnO) films doped with aluminum and hydrogen. Doped ZnO films were prepared by r.f. magnetron sputter and followed by heat treatment at different temperatures and for various times.

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참고문헌

  1. H. L. Hartnagel, A. L. Dawar, A. K. jain, and C. Jagadish, "Semiconducting Transparent Thin Films", Insitute of Physics Publishing, Bristol and Philadelphia, 1995
  2. T. Minami, H. Sato, H. Nato, and S. Takada, "Heat treatment in Hydrogen gas and plasma for transparent conduction oxide films such as ZnO, $SnO_{2}$ and indium tin oxide", Thin Solid Films, Vol. 176, p. 227, 1989 https://doi.org/10.1016/0040-6090(89)90096-5
  3. S. Takata, T. Minami, and H. Nato, "The stablility of aluminium-doped ZnO transparent electrodes fabricated by sputtering", Thin Solid Films, Vol. 135, p. 184, 1986
  4. 이동진, 이재형, 주정훈, 이종인, 정학기, 정동수, 송준태, "Polyimide 기판을 이용한 ZnO:Al 박막 특성에 관한 연구", 전기전자재료학회논문지, 20권, 8호, p. 666, 2007 https://doi.org/10.4313/JKEM.2007.20.8.666
  5. 김봉석, 이규일, 강현일, 이태용, 오수영, 이종환, 송준태, "다층박막을 이용한 Ga-doped ZnO 투명전도막의 특성", 전기전자재료학회논문지, 20권, 12호, p. 1044, 2007 https://doi.org/10.4313/JKEM.2007.20.12.1044
  6. F. C. M. VanDe Pol, F. R. Blom, and TH. J. A. Popma, "R.f. planar magnetron sputtered ZnO films I: Structural properties", Thin Solid Film, Vol. 204, p. 349, 1991 https://doi.org/10.1016/0040-6090(91)90074-8