임프린트 기반 마이크로 광도파로의 변형 특성 연구

Dimensional Stability of an Imprinted Microoptic Waveguide

  • 류진화 (부산대학교 나노과학기술대학) ;
  • 김창석 (부산대학교 나노과학기술대학) ;
  • 정명영 (부산대학교 나노과학기술대학)
  • Ryu, Jin-Hwa (College of Nano science and technology, Pusan National Univ.) ;
  • Kim, Chang-Seok (College of Nano science and technology, Pusan National Univ.) ;
  • Jeong, Myung-Yung (College of Nano science and technology, Pusan National Univ.)
  • 발행 : 2008.11.01

초록

We have studied the characteristic changes of optical device using imprint lithography. An imprinted structure is inherently involved in residual stress due to the temperature and the pressure cycle during fabrication process. A structure with residual stress undergoes stress relaxation, which leads io dimensional change. Therefore, annealing processes was performed to reduce the residual stress of imprinted polymer channel. Reduction of residual stress was confirmed through dimensional change, birefringence, and the mechanical properties. We have fabricated an optical device, and it saw the optical intensity changes within 0.1% for 1 month.

키워드

참고문헌

  1. Stephen, Y. C., Peter, R. K. and Preston,J. R., "Nanoimprint lithography," J. Vac. Sci. Technol. B, Vol. 14, No. 6, pp. 4129-4133, 1996 https://doi.org/10.1116/1.588605
  2. Ryu, J. H., Jeong, M. Y. and Kim, C. S., "Fabrication of Nanoscale Structures using SPL and Soft Lithography," J. of KSPE, Vol. 23, No. 7, pp. 138-145, 2006
  3. Cho, I. K., Lee, W. J., Jeong, M. Y. and Park, H. H., "Optical Module Using Polymer Waveguide With Integrated Reflector Mirrors," IEEE Photonics Technology Letters, Vol. 20, No. 6, pp. 410-412, 2008 https://doi.org/10.1109/LPT.2008.916923
  4. Scheer, H. C., Bogdanski, N., Wissen, M., Konishi, T.and Hirai, Y., "Profile evolution during thermal nanoimprint," Microelectronic Engineering, Vol. 83, No. 4-9, pp. 843-846, 2006 https://doi.org/10.1016/j.mee.2006.01.255
  5. Ronald, L. J., Tengjiao, H., Christopher, L. S., Eric, K. L., Ronald, M. R., Stella, W. P. and Diego, M. C., "Real-Time Shape Evolution of Nanoimprinted Polymer Structures during Thermal Annealing," Nano Letters, Vol. 6, No. 8, pp. 1723-1728, 2006 https://doi.org/10.1021/nl061086i
  6. Yifu, D., Hyun, W. R., Jack, F. D., Ronald, L. J., Daniel, R. H., Alamgir, K. and Christopher, L. S., "Polymer Viscoelasticity and Residual Stress Effects on Nanoimprint Lithography," Advanced Materials, Vol. 19, No. 10, pp. 1377-1382, 2007 https://doi.org/10.1002/adma.200601998
  7. Hesham, A. and Ebtisam, H., "Annealing Effect on Microhardness and Elastic Constants of PMMA," Polymer-Plastics Technology and Engineering, Vol. 42, No. 4, pp. 543-554, 2003 https://doi.org/10.1081/PPT-120023094