한국정밀공학회지 (Journal of the Korean Society for Precision Engineering)

  • 제26권3호
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  • Pages.122-128
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  • 2009
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  • 1225-9071(pISSN)
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  • 2287-8769(eISSN)
한국정밀공학회 (Korean Society for Precision Engineering)
권호 표지

DBD(Dielectric Barrier Discharges)에서 전공 플라즈마 발생에 대한 해석적 연구

An Analysis of Vacuum Plasma Phenomena in DBD(Dielectric Barrier Discharges)

  • 선명수 (서울산업대학교 NID 융합기술대학원) ;
  • 차성훈 (서울산업대학교 NID 융합기술대학원) ;
  • 김종봉 (서울산업대학교 자동차공학과) ;
  • 김종호 (서울산업대학교 금형설계학과) ;
  • 김성영 ((주)어플라이드 플라즈마) ;
  • 이혜진 (한국생산기술연구원)
  • Shin, Myoung-Soo (Graduate School of NID, Seoul National Univ. of Technology) ;
  • Cha, Sung-Hoon (Graduate School of NID, Seoul National Univ. of Technology) ;
  • Kim, Jong-Bong (Department of Automotive Engineering, Seoul National Univ. of Technology) ;
  • Kim, Jong-Ho (Department of Die & Mould Design, Seoul National Univ. of Technology) ;
  • Kim, Seong-Young (Applied Plasma Co.) ;
  • Lee, Hye-Jin (Korea Institute of Industrial Technology)
  • 발행 : 2009.03.01
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초록

DBD(Dielectric Barrier Discharges) plasma is often used to clean the surface of semiconductor. The cleaning performance is affected mainly by plasma density and duration time. In this study, the plasma density is predicted by coupled simulation of flow, chemistry mixing and reaction, plasma, and electric field. 13.56 MHz of RF source is used to generate plasma. The effect of dielectric thickness, gap distance, and flow velocity on plasma density is investigated. It is shown that the plasma density increases as the dielectric thickness decreases and the gap distance increases.

키워드

참고문헌

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