Journal of the Korean Ceramic Society (한국세라믹학회지)

The Korean Ceramic Society (한국세라믹학회)
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Microstructure and Mechanical Properties of Nanocrystalline TiN Films Through Increasing Substrate Bias

기판 바이어스 인가에 따른 나노결정질 TiN 코팅 막의 미세구조와 기계적 성질변화

  • Chun, Sung-Yong (Department of Advanced Materials Science and Engineering, Mokpo National University)
  • 전성용 (목포대학교 신소재공학과)
  • Received : 2010.09.06
  • Accepted : 2010.10.26
  • Published : 2010.11.30
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Abstract

Microstructural and mechanical properties of the TiN films deposited on Si substrates under various substrate bias voltages by a reactive magnetron sputtering have been studied. It was found that the crystallographic texture, microstructural morphology and mechanical property of the TiN films were strongly depended on the substrate bias voltage. TiN films deposited without bias exhibited a mixed (200)-(111) texture with a strong (200) texture, which subsequently changed to a strong (111) texture with increasing bias voltage. It is also observed that the crystallite size decreases with increasing bias voltage, which corresponds to the increasing diffraction peak width of XRD patterns. The average surface roughness was calculated from AFM images of the films; these results indicated that the average surface roughness was increased with an increase in the bias voltage of the coatings.

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References

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