접촉식 리소그라피의 정렬공정을 위한 압전구동 초정밀 스테이지

A Piezo-driven Ultra-precision Stage for Alignment Process of a Contact-type Lithography

  • 최기봉 (한국기계연구원 나노융합시스템연구본부) ;
  • 이재종 (한국기계연구원 나노융합시스템연구본부) ;
  • 김기홍 (한국기계연구원 나노융합시스템연구본부) ;
  • 임형준 (한국기계연구원 나노융합시스템연구본부)
  • 투고 : 2011.06.16
  • 심사 : 2011.08.19
  • 발행 : 2011.12.15

초록

This paper proposed an alignment stage driven by piezo actuators for alignment process of a contact-type lithography. Among contact-type lithography processes, an UV-curable nanoimprint process is an unique process to be able to align patterns on upper and lower layers. An alignment stage of the UV-curable nanoimprint process requires nano-level resolution as well as high stiffness to overcome friction force due to contact moving. In this paper, the alignment stage consists of a compliant mechanism using flexure hinges, piezo actuators for high force generation, and capacitive sensors for high-resolution measurement. The compliant mechanism is implemented by four prismatic-prismatic compliant chains for two degree-of-freedom translations. The compliant mechanism is composed of flexure hinges with high stiffness, and it is directly actuated by the piezo actuators which increases the stiffness of the mechanism, also. The performance of the ultra-precision stage is demonstrated by experiments.

키워드

참고문헌

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