Journal of the Korean Crystal Growth and Crystal Technology (한국결정성장학회지)

The Korea Association of Crystal Growth (한국결정성장학회)
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Growth and optical conductivity properties for MnAl2S4 single crystal thin film by hot wall epitaxy method

Hot Wall Epitaxy(HWE)법에 의한 MnAl2S4 단결정 박막 성장과 광전도 특성

  • Received : 2014.07.14
  • Accepted : 2014.08.22
  • Published : 2014.12.31
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Abstract

A stoichiometric mixture of evaporating materials for $MnAl_2S_4$ single crystal thin films was prepared from horizontal electric furnace. To obtain the single crystal thin films, $MnAl_2S_4$ mixed crystal was deposited on thoroughly etched semi-insulating GaAs(100) substrate by the Hot Wall Epitaxy (HWE) system. The source and substrate temperatures were $630^{\circ}C$ and $410^{\circ}C$, respectively. The crystalline structure of the single crystal thin films was investigated by the photoluminescence and double crystal X-ray diffraction (DCXD). The temperature dependence of the energy band gap of the $MnAl_2S_4$ obtained from the absorption spectra was well described by the Varshni's relation, $E_g(T)=3.7920eV-5.2729{\times}10^{-4}eV/K)T^2/(T+786 K)$. In order to explore the applicability as a photoconductive cell, we measured the sensitivity (${\gamma}$), the ratio of photocurrent to dark current (pc/dc), maximum allowable power dissipation (MAPD) and response time. The results indicated that the photoconductive characteristic were the best for the samples annealed in S vapour compare with in Mn, Al, air and vacuum vapour. Then we obtained the sensitivity of 0.93, the value of pc/dc of $1.10{\times}10^7$, the MAPD of 316 mW, and the rise and decay time of 14.8 ms and 12.1 ms, respectively.

수평 전기로에서 $MnAl_2S_4$ 다결정을 합성하여 HWE(Hot Wall Epitaxy)방법으로 $MnAl_2S_4$ 단결정 박막을 반절연성 GaAs(100)기판에 성장시켰다. $MnAl_2S_4$ 단결정 박막의 성장 조건은 증발원의 온도 $630^{\circ}C$, 기판의 온도 $410^{\circ}C$였고 성장 속도는 $0.5{\mu}m/hr$였다. 이때 $MnAl_2S_4$ 단결정 박막의 결정성의 조사에서 이중결정 X-선 요동곡선(DCRC)의 반폭치(FWHM)도 132 arcsec로 가장 작아 최적 성장 조건임을 알 수 있었다. $MnAl_2S_4$/SI(Semi-Insulated) GaAs(100) 단결정 박막의 광흡수를 293 K에서 10 K까지 측정하였다. 광흡수 스펙트럼으로부터 band gap $E_g(T)$는 Varshni 공식에 따라 계산한 결과 $E_g(T)=3.7920eV-(5.2729{\times}10^{-4}eV/K)T^2/(T+786K)$였다. $MnAl_2S_4$ 단결정 박막의 응용소자인 photocell로 사용할 수 있는 pc/dc 값이 가장 큰 광전도셀은 S 증기분위기에서 열처리한 셀로 $1.10{\times}10^7$이었으며, 광전도 셀의 감도(sensitivity)도 S 증기분위기에서 열처리한 셀이 0.93로 가장 좋았다. 또한 최대 허용소비전력(MAPD)값도 S 증기분위기에서 열처리한 셀이 316 mW로 가장 좋았으며, S 증기분위기에서 열처리한 셀의 응답시간은 오름시간 14.8 ms, 내림시간 12.1 ms로 가장 빠르게 나타나, $MnAl_2S_4$ 단결정 박막을 S 분위기에서 $290^{\circ}C$로 30분 열처리한 photocell이 상용화가 가능할 것으로 여겨진다.

Keywords

References

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