Korean Journal of Materials Research (한국재료학회지)

Materials Research Society of Korea (한국재료학회)
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Electrical and Optical Properties of F-Doped SnO2 Thin Film/Ag Nanowire Double Layers

F-Doped SnO2 Thin Film/Ag Nanowire 이중층의 전기적 및 광학적 특성

  • Kim, Jong-Min (Department of Materials Science and Engineering, Seoul National University of Science and Technology) ;
  • Koo, Bon-Ryul (Department of Materials Science and Engineering, Seoul National University of Science and Technology) ;
  • Ahn, Hyo-Jin (Department of Materials Science and Engineering, Seoul National University of Science and Technology) ;
  • Lee, Tae-Kun (Department of Materials Science and Engineering, Seoul National University of Science and Technology)
  • 김종민 (서울과학기술대학교 신소재공학과) ;
  • 구본율 (서울과학기술대학교 신소재공학과) ;
  • 안효진 (서울과학기술대학교 신소재공학과) ;
  • 이태근 (서울과학기술대학교 신소재공학과)
  • Received : 2015.02.02
  • Accepted : 2015.02.13
  • Published : 2015.03.27
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Abstract

Fluorine-doped $SnO_2$ (FTO) thin film/Ag nanowire (NW) double layers were fabricated by means of spin coating and ultrasonic spray pyrolysis. To investigate the optimum thickness of the FTO thin films when used as protection layer for Ag NWs, the deposition time of the ultrasonic spray pyrolysis process was varied at 0, 1, 3, 5, or 10 min. The structural, chemical, morphological, electrical, and optical properties of the double layers were examined using X-ray diffraction, X-ray photoelectron spectroscopy, field-emission scanning electron microscopy, transmission electron microscopy, the Hall effect measurement system, and UV-Vis spectrophotometry. Although pure Ag NWs formed isolated droplet-shaped Ag particles at an annealing temperature of $300^{\circ}C$, Ag NWs covered by FTO thin films maintained their high-aspect-ratio morphology. As the deposition time of the FTO thin films increased, the electrical and optical properties of the double layers degraded gradually. Therefore, the double layer fabricated with FTO thin films deposited for 1 min exhibited superb sheet resistance (${\sim}14.9{\Omega}/{\Box}$), high optical transmittance (~88.6 %), the best FOM (${\sim}19.9{\times}10^{-3}{\Omega}^{-1}$), and excellent thermal stability at an annealing temperature of $300^{\circ}C$ owing to the good morphology maintenance of the Ag NWs covered by FTO thin films.

Keywords

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