Fig. 1. (a) Air-floating device for OLED display manufacture. (b) A schematic of OLED deposition module using vacuum chucking and air-floating devices. In deposition process zone, air-floating is employed for fixing a substrate. For loading and supporting a substrate, vacuum chucking is used. (c) vacuum chucking device for LCD substrates.
Fig. 3. FE-SEM images of TiO2-MnO (TMO) ceramics with 30 % P-25 sintered at (a) 1100℃, (b) 1200℃, (c) 1300℃.
Fig. 4. FE-SEM images of TiO2-MnO (TMO) ceramics sintered at 1100℃ with (a) 30 % P-25, (b) 40 % P-25, (× 1,000 magnification), (c) 30 % P-25, (d) 40 % P-25, (× 3,000 magnification) (e) 30 % P-25, (f) 40 % P-25 (× 10,000 magnification).
Fig. 5. FE-SEM images of TiO2-MnO (TMO) ceramics sintered at 1200℃ with (a) 30 % P-25, (b) 40 % P-25, (× 1,000 magnification), (c) 30 % P-25, (d) 40 % P-25, (× 3,000 magnification) (e) 30 % P-25, (f) 40 % P-25 (× 10,000 magnification).
Fig. 6. Evolution of porosity of TMO ceramics according to amounts of P-25 and sintering temperature.
Fig. 7. Evolution of flexural strength of TMO ceramics according to amounts of P-25 and sintering temperature.
Fig. 8. Evolution of flexural strength of TMO ceramics as a function of porosity.
Fig. 2. X-ray diffraction patterns for the sintered specimens of TiO2-MnO (P-25 30 %) sintered at (a) 1100℃ and (c) 1200℃. TiO2-MnO (P-25 40 %) (b) 1100℃, (d) 1200℃, and (e) 1300℃.
Fig. 9. (a) Evolution of surface resistivity of TMO ceramics as a function of P-25 amount and sintering temperature. (b) A schematic of surface resistivity measurement. (c) A demonstration of air-floating using TMO ceramics.
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