Korean Journal of Materials Research (한국재료학회지)

Materials Research Society of Korea (한국재료학회)
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Fabrication of Anti-Reflection Thin Film by Using Screen Printing Method

Screen Printing법을 이용한 반사방지막 제조

  • Choi, Chang-Sik (Korea Institute of Ceramic Engineering and Technology, Optic & Display Materials Center) ;
  • Nam, Jeong-Sic (Korea Institute of Ceramic Engineering and Technology, Optic & Display Materials Center) ;
  • Lee, Ji-Sun (Korea Institute of Ceramic Engineering and Technology, Optic & Display Materials Center) ;
  • Jeon, Dae-Woo (Korea Institute of Ceramic Engineering and Technology, Optic & Display Materials Center) ;
  • Lee, Young-jin (Korea Institute of Ceramic Engineering and Technology, Optic & Display Materials Center) ;
  • Bae, Hyun (Shinceramic co., ltd) ;
  • Kim, Jin-Ho (Korea Institute of Ceramic Engineering and Technology, Optic & Display Materials Center)
  • 최창식 (한국세라믹기술원 광.디스플레이 소재센터) ;
  • 남정식 (한국세라믹기술원 광.디스플레이 소재센터) ;
  • 이지선 (한국세라믹기술원 광.디스플레이 소재센터) ;
  • 전대우 (한국세라믹기술원 광.디스플레이 소재센터) ;
  • 이영진 (한국세라믹기술원 광.디스플레이 소재센터) ;
  • 배현 (신세라믹 주식회사) ;
  • 김진호 (한국세라믹기술원 광.디스플레이 소재센터)
  • Received : 2018.08.14
  • Accepted : 2018.11.13
  • Published : 2018.12.27
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Abstract

Anti-reflection thin films are fabricated on glass substrates using the screen printing method. Tetra ethyl silicate(TEOS) and methyl tri methoxy silane(MTMS) are used as starting materials and buthyl carbitol acetate(BCA) and buthyl cellusolve(BC) are mixed to improve the viscosity of the solution. Anti-reflection thin films are fabricated according to the number of the screen mesh and the characteristics improve as the mesh size increases. The transmittance and reflectance of the coated thin film using 325 mesh are about 94 % and 0.43 % in the visible wavelength. The thickness and refractive index of the AR thin film are 107 nm and n = 1.26, respectively.

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References

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