Journal of the Semiconductor & Display Technology (반도체디스플레이기술학회지)

The Korean Society Of Semiconductor & Display Technology (한국반도체디스플레이기술학회)
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The Research via Linear of Tantalum Thin Film Thickness Depending on Revolution Velocity of Spin Coater

스핀코터 회전속도에 따른 탄탈륨 박막두께의 선형모델에 관한 연구

  • 김승욱 (구미대학교 기계공학과)
  • Received : 2020.02.20
  • Accepted : 2020.03.18
  • Published : 2020.03.31
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Abstract

Recently, the decrease in thin film thickness has been actively studied by changing several physical elements such as the increase in revolution velocity of lower substrate equipped with AC or DC motor. In this paper, we propose a novel spin coater control system that changes AC or DC motor and common use software with limitation of velocity and position control into step motor and LABVIEW software based on GUI to control revolution velocity and position more precisely. By determining six input values of rotation velocity 1, 5, 10, 25, 50, 100 PPS, we fabricated six samples using coating target, TA(tantalum) on silicon substrate and measured their thin film thickness by SEM. Hence, this research can be applied to inferring thin film thickness of tantalum regarding any value of revolution velocity without additional experiments and for linear reference model via property analysis of thin film thickness using other thin-film materials.

Keywords

References

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