Nuclear Engineering and Technology

Korean Nuclear Society (한국원자력학회)
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Electrochemical corrosion study of helium ions implanted Zircaloy-4 in chloride media

  • Rafique, Mohsin (Centre for Advanced Studies in Physics, GC University) ;
  • Khan, Atika (Centre for Advanced Studies in Physics, GC University) ;
  • Afzal, Naveed (Centre for Advanced Studies in Physics, GC University) ;
  • Farooq, Ameeq (Corrosion Control Research Cell, Department of Metallurgy and Materials Engineering, CEET, University of the Punjab) ;
  • Imran, M. (Department of Physics, GC University)
  • Received : 2020.02.06
  • Accepted : 2020.08.03
  • Published : 2021.03.25
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Abstract

In this work, an attempt is made to improve the electrochemical corrosion resistance of Zircaloy-4 by helium ions implantation. For this purpose, the Zircaloy-4 was implanted with 300 keV helium ions of fluences 1 × 1013, 1 × 1015, and 1 × 1016 ions-cm-2 by using Pelletron Accelerator. Electrochemical tests of pristine and ion-implanted samples were performed in NaCl solution and their potentiodynamic polarization curves were obtained. The results showed enhancement of the corrosion resistance of Zircaloy-4 after helium ions implantation. The corrosion rate and current density of the material were significantly reduced by the helium implantation. The decrease in corrosion parameters was attributed to helium ions diffusion inside Zircaloy-4 that reduced the electrons flow from the samples.

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