RF플라즈마CVD법에 의한 Diamond 박막의 성장에 관한 연구

A study on deposition of diamond thin films by RF plasma CVD

  • Jang, Jae-Deog (Department of Electrical Engineering, Kyung-nam University) ;
  • Koo, Hyo-Geun (Department of Electrical Engineering, Kyung-nam University) ;
  • Lee, Chwi-Cung (Department of Electrical Engineering, Kyung-nam University) ;
  • Park, Sang-Hyun (Department of Electrical Engineering, Kyung-nam University) ;
  • Kim, Jung-Dal (Department of Electrical Engineering, Kyung-nam University)
  • 발행 : 1992.11.07

초록

Using RF plasma CVD the diamond particles and films were deposited on Si and quartz substrate from $CH_4$-$H_2$ mixed gas. The temperature of substrate was uniformly maintained by inserting matal plate between substrate and substrate holder. As a result, the deposited diamond particles were mainly twins. The deposited diamond films were identified by SEM, XRD and Raman spectroscopy.

키워드