Ion Beam Assisted Depposition법에 의한 TiN 박막 제작 및 특성연구

Cu film growth on Si substrate by combining plasma enhanced chemical vapor deposition with partially ionized beam deposition

  • Kim, K.H. (Division of Ceramics, Korea Institute of Science and Technology, pp.O. Box 131 Chengryang, Seoul, 130-650 Korea) ;
  • Park, S.C. (Division of Ceramics, Korea Institute of Science and Technology, pp.O. Box 131 Chengryang, Seoul, 130-650 Korea) ;
  • Park, G.J. (Deppartment of Ceramic Engineering, Yonsei University.) ;
  • Park, G.J. (Division of Chemical Engineering, Korea Insitute of Science and Technology, pp.O. Box 131 Chengryang, ) ;
  • Jung H.J. (Division of Chemical Engineering, Korea Insitute of Science and Technology, pp.O. Box 131 Chengryang, ) ;
  • Koh S.K. (Division of Ceramics, Korea Institute of Science and Technology, pp.O. Box 131 Chengryang, Seoul, 130-650 Korea)
  • 발행 : 1997.07.01