ANALYSIS OF ETCHED SILICON SURFACE FOR TRENCH ISOLATION TECHNIQUES

  • Kim, S.G. (Semicon Div. ETRI) ;
  • Kim, J. (Semicon Div. ETRI) ;
  • Lee, J.W. (Semicon Div. ETRI) ;
  • Rho, T.M. (Semicon Div. ETRI) ;
  • Koo, J.G. (Semicon Div. ETRI) ;
  • Nam, K.S. (Semicon Div. ETRI)
  • Published : 1998.08.01