한국정보디스플레이학회:학술대회논문집
- 2007.08a
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- Pages.867-870
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- 2007
Improvement of Photo-Alignment Characteristics for Device Applications
- Hwang, Yong-Jae (Dept. of chemical engineering, Hong-Ik University) ;
- Choi, Kil-Yeong (Advanced Materials Division, KRICT) ;
- Yi, Mi-Hie (Advanced Materials Division, KRICT) ;
- Hong, Sung-Hwan (Dept. of chemical engineering, Hong-Ik University) ;
- Shin, Dong-Myung (Dept. of chemical engineering, Hong-Ik University)
- Published : 2007.08.27
Abstract
In order to solve image sticking phenomena, the gas-phase and liquid-phase interfacial reactions of photosensitive polyimide can annihilate photoreactive carbon-carbon double bonds, which remain after photo-alignment process. The annihilation processes dramatically affect residual DC and photochemical reorientation of photoactive functional groups.