한국정보디스플레이학회:학술대회논문집
- 2008.10a
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- Pages.816-819
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- 2008
Synthesis of Imide Monomers for Application to Organic Photosensitive Interdielectric Layer
- Kwon, Hyeok-Yong (Department of Sensor & Display, Kyungpook National University) ;
- Vu, Quang Hung (Department of Polymer Science, Kyungpook National University) ;
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Lee, Yun-Soo
(Advanced Display Manufacturing Research Center, Kyungpook National University)
;
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Park, Lee-Soon
(Department of Polymer Science, Kyungpook National University)
- Published : 2008.10.13
Abstract
A negative photoresist formulation was developed utilizing synthesized UV monomers containing imide linkage, photoinitiator, UV oligomer, and alkali developable polymer matrix. It was found that via-holes with good resolution, high transmittance and thermal resistance could be obtained by photolithographic process utilizing the negative-type photoresist formulations.