한국정보디스플레이학회:학술대회논문집

The Korean Infomation Display Society (한국정보디스플레이학회)
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Material Design for the Fabrication of Barrier Ribs with High Aspect Ratio of Plasma Display Panel by X-ray Lithography

  • Ryu, Seung-Min (Sch. of Mechanical Engineering & Aerospace System, KAIST) ;
  • Yang, Dong-Yol (Sch. of Mechanical Engineering & Aerospace System, KAIST) ;
  • So, Jae-Yong (Dept. of Polymer Science, Kyungpook Nat. Univ.) ;
  • Park, Lee-Soon (Dept. of Polymer Science, Kyungpook Nat. Univ.)
  • Published : 2008.10.13
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Abstract

X-ray lithography is one of the most powerful processes in the fabrication of nano/micro structures with a high aspect ratio. This process enables the fabrication of ultra-thin barrier ribs for PDP using X-ray sensitive paste. In this paper, organic material including photo-monomers, photo-oligomers, binder polymer and additives as well as inorganic powders with different size were optimized to fabricate high aspect ratio barrier rib pattern for PDP.

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