극미세 점 구조체 제작을 위한 나노압입 공정에서 PMMA의 시간의존적 변형거동에 관한 연구

A Study on the Time-Dependent Deformation Behaviors of PMMA in Nanoindentation Process for Hyperfine Pit Structure Fabrication

  • 김현일 (부산대 정밀기계공학과) ;
  • 강충길 (부산대 기계공학부, 틱소/레오성형연구실(NRL)) ;
  • 윤성원 (부산대 정밀기계공학과)
  • 발행 : 2005.07.01

초록

The nanoindenter and AFM have been used for nanofabrication, such as nanolithography, nanowriting, and nanopatterning, as well as measurement of mechanical properties and surface topology. Nanoscale indents can be used as cells for molecular electronics and drug delivery, slots for integration into nanodevices, and defects for tailoring the structure and properties. Therefore, it is very important to make indents of desired morphology (shape, size and depth). Indents of different shapes can be obtained by using indenters of different geometries such as a cube comer and conical and spherical tips. The depth and size of indents can be controlled by making indentations at different indentation loads. However, in case of viscoplastic viscoelastic materials such as polymethylmethacrylate (PMMA) the time dependent deformation (TDD) should also be considered. In this study, the effect of process parameters such as loading rate and hold-time at peak load on the indent morphology (maximum penetration depth, elastic recovery, transient creep recovery, residual depth pile-up height) of PMMA were studied for hyperfine pattern fabrication.

키워드

참고문헌

  1. Chang, W. S., Shin, B. S., Whang, K. H., 'Nanoprobe Application Technologies,' J. Kor. Soc. Prec. Eng., Vol. 20, No.3, pp. 5-14, 2003
  2. Cappella, B., Sturm, H., Weidner, S.M., 'Breaking polymer chains by dynamic plowing lithography,' Polymer, Vol. 43, pp. 4461-4466, 2002 https://doi.org/10.1016/S0032-3861(02)00285-9
  3. Wiesauer, K., Springholz, G., 'Fabrication of semiconductor nanostructures by nano-indentation of photo resist layers using atomic force microscopy,' J. Appl. Phys., Vol. 88, No. 12, pp.7289-7297, 2000 https://doi.org/10.1063/1.1324693
  4. Sung, I.H., Kim, D.E., Chang, W.S., 'Mechano-chemical high-speed nanopatteming technology,' Proc. of KSME Autumn Conference (KSME 03PD13), pp. 57-60, 2003
  5. Despont, M., Brugger, J., Drechsler, U., Durig, U., Haberle, W., Lutwyche, M., Rothuizen, H., Stutz, R. Widmer, R., Binnig, G., Rohrer, H., Vettiger, P., 'VLSI-NEMS chip for parallel AFM data storage,' Sensor. Actuat. A-Phys., Vol. 80, pp. 100-107, 2000 https://doi.org/10.1016/S0924-4247(99)00254-X
  6. Youn, S.W., Kang, C.G., Key Eng. Mater., 'Maskless fabrication of the silicon stamper and its application to the PDMS casting process,' Vol. 204-276, pp. 445-450, 2004
  7. Hahn, J. H., Lee, K. R., Kim, K. S., Lee, S. Y., 'Principal and applications of nanoindentation test,' J. Kor. Soc. Precis. Eng., Vol. 19, No.3, pp. 19-26, 2002
  8. Li, Xiaodong, Gao, Hongsheng, Murphy, Catherine J., Caswell, K. K., 'Nanoindentation of silver nanowires,' Nano Lett., Vol. 3, No. 11, pp. 1495-1498, 2003 https://doi.org/10.1021/nl034525b
  9. Oliver, W. C., Pharr, G. M., 'An improved technique for determining hardness and elastic modulus using load and displacement sensing indentation experiments,' J. Mater. Res., Vol. 7, No.6, p. 1564-1583, 1992 https://doi.org/10.1557/JMR.1992.1564
  10. Fischer-Cripps, Anthony C., 'Nanindentation (Mecha. Eng. Series),' Springer-Verlag, 2002
  11. Dowling, N.E., 'Mechanical behavior of materials Engineering methods for deformation, fracture, fatigue,' Prentice hall(New Jersy, USA), pp.689-690, 1993