Korean Journal of Materials Research (한국재료학회지)

Materials Research Society of Korea (한국재료학회)
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Effect of Processing Parameters on the Formation of Large Area Self-Assembled Monolayer of Polystyrene Beads by a Convective Self-Assembly Method

대류성 자기조립법을 통한 폴리스티렌 비드 대면적 단일층 형성에 미치는 공정 변수 효과

  • Seo, Ahn-na (Center for Electronic Materials Research, Korea Institute of Science and Technology) ;
  • Choi, Ji-Hwan (Department of Materials Science and Engineering, Korea University) ;
  • Pyun, Jae-chul (Department of Materials Science and Engineering, Yonsei University) ;
  • Kim, Won Mok (Center for Electronic Materials Research, Korea Institute of Science and Technology) ;
  • Kim, Inho (Center for Electronic Materials Research, Korea Institute of Science and Technology) ;
  • Lee, Kyeong-Seok (Center for Electronic Materials Research, Korea Institute of Science and Technology)
  • 서안나 (한국과학기술연구원 전자재료연구단) ;
  • 최지환 (고려대학교 신소재공학과) ;
  • 변재철 (연세대학교 신소재공학과) ;
  • 김원목 (한국과학기술연구원 전자재료연구단) ;
  • 김인호 (한국과학기술연구원 전자재료연구단) ;
  • 이경석 (한국과학기술연구원 전자재료연구단)
  • Received : 2015.06.26
  • Accepted : 2015.10.19
  • Published : 2015.12.27
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Abstract

Self-assembled monolayers(SAM) of microspheres such as silica and polystyrene(PS) beads have found widespread application in photonic crystals, sensors, and lithographic masks or templates. From a practical viewpoint, setting up a high-throughput process to form a SAM over large areas in a controllable manner is a key challenging issue. Various methods have been suggested including drop casting, spin coating, Langmuir Blodgett, and convective self-assembly(CSA) techniques. Among these, the CSA method has recently attracted attention due to its potential scalability to an automated high-throughput process. By controlling various parameters, this process can be precisely tuned to achieve well-ordered arrays of microspheres. In this study, using a restricted meniscus CSA method, we systematically investigate the effect of the processing parameters on the formation of large area self-assembled monolayers of PS beads. A way to provide hydrophilicity, a prerequisite for a CSA, to the surface of a hydrophobic photoresist layer, is presented in order to apply the SAM of the PS beads as a mask for photonic nanojet lithography.

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References

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