• Title/Summary/Keyword: Photoresist

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Fabrication of the Photoresist Surface-Relief Phase Holographic Grating and Its Performance Test (포토레지스트 surface-Relief 위상형 홀로그라피 분광회절격자의 제작 및 성능평가)

  • 정만호;이인원;이상배;박민용
    • Journal of the Korean Institute of Telematics and Electronics
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    • v.24 no.5
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    • pp.868-873
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    • 1987

  • Holographic diffraction gratings which are the core element of the optical instruments such as a spectrophotometer have been fabricated using the photoresist as a recording material. A 488nm line from an argon laser is used in making the gratings. Transmission type surface-relief phase grating and reflection type which is fabsricated by coating the aluminum on the transmission type with thickness 2000\ulcornerare fabricated, the spatical frequency of which are 1200 lines/mm. Diffraction efficiency, scattered light and wave-front aberratin are measured to test the performance of the developed gratings. A marimum diffraction efficiency is given when light is incident at the Bragg angle. Theoretical efficiency is about 80%, but measured efficiency of the transmission type and reflection type is 50% and 45%, respectively.

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Statistical Characterization and Optimization of SU-8 Photoresist Processing by Response Surface Methodology (반응표면분석을 통한 SU-8 포토레지스트의 특성 및 최적화)

  • Mun, Sei-Young;Kim, Gwang-Beom;Soh, Dae-Wha;Hong, Sang-Jeen
    • Proceedings of the Korean Institute of Information and Commucation Sciences Conference
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    • v.9 no.2
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    • pp.891-894
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    • 2005

  • SU-8은 부드러운 벽면을 가지는 두꺼운 패턴을 제작하는 데 사용되는 음성 감광제(negative photoresist)이다 .이것은 처리 후에 강성이 높고 화학적으로 강인한 장점을 가지고 있으며 최근 MEMS 디바이스의 구조체로 쓰이고 있다. 그러나 SU-8은 공정 처리요소들에 대하여 매우 민감하고 사용하기 어려운 것으로 알려져 있다. 본 연구에서는 공정 처리요소로 exposure energy, post exposure bake (PEB) temperature, PEB time을 조절하여 실험을 하였다. Response Surface Methodology (RSM)를 이용해 각 인자가 delamination에 미치는 영향에 대해 분석하였고 이를 바탕으로 SU-8의 delamination을 최소화하기 위한 처리요소들의 최적화 방안을 제시하였다.

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Fabrication of Glass Etching Mask using Various Polymers and Metals and Test of it in Glass Micromaching (폴리머와 금속을 이용한 유리 식각 마스크의 저작 및 이를 이용한 유리 가공)

  • Jeon, Do-Han;Sim, Woo-Young;Yang, Sang-Sik
    • Proceedings of the KIEE Conference
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    • 2004.11a
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    • pp.268-270
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    • 2004

  • This paper reports a novel masking method with various mask materials for wet etching of glass. Various mask materials such as Cr/Au, Ti/Au, Polyimide and thick SU-8 photoresist were investigated for borosilicate glass (Borofloat33) etching in concentrated hydrofluoric acid (48% HF). Polyimide and thick SU-8 photoresist are not suitable as masking material due to its poor adhesion to glass surfaces. Titanium has good adhesion is suitable as the first layer to make multi-protective layers. The best protection was obtained with a combination of Ti/Au, polyimide and Ti/Au as masking material with etch depth of $350{\mu}m$ achieved.

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Optical Principle of Microlithography system (Micro-Lithography의 광학적 원리)

  • 이성묵;임동규
    • Proceedings of the Optical Society of Korea Conference
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    • 1991.07a
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    • pp.109-114
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    • 1991

  • 좋은(sub=micron) 분해능을 갖는 Photoresist film의 방법에 의한 Micro-Lithography의 발달은 반도체, Electro-Optic 등의 첨단산업에 큰 기여를 하였다. 본 내용은 이러한 PR을 이용한 Lithography System의 광학적인 원리에 대해 소개하고자 한다.

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