한국전기전자재료학회:학술대회논문집 (Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference)
- 한국전기전자재료학회 2003년도 제5회 학술대회 논문집 일렉트렛트 및 응용기술연구회
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- Pages.25-28
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- 2003
금속 산화물 박막 제작을 위한 산화 시스템의 평가
Evaluation of Oxidation System for Metal Oxide Thin Film
- Lim, Jung-Kwan (Dongshin Uni.) ;
- Ryu, Sun-Jong (Dongshin Uni.) ;
- Park, Yong-Pil (Dongshin Uni.)
- 발행 : 2003.05.30
초록
Ozone is a strong and useful oxidizing gas for the fabrication of oxide thin films. In order to obtain high quality oxide thin films, higher ozone concentration is necessary. In this paper an ozone condensation system was evaluated from the viewpoint of an ozone supplier for oxide thin film growth. Ozone was condensed by an adsorption method and the ozone concentration reached 8.5 mol% in 2.5 h after the beginning of the ozone condensation process, indicating high effectiveness of the condensation process. Ozone was continuously desorbed from the silica gel by the negative pressure. We found the decomposition in the ozone concentration negligible if the condensed ozone is transferred from the ozone condensation system to the film growth chamber within a few minutes.