Atmospheric pressure plasma deposition of $SiO_X$ thin films by direct-Type pin-to-plate dielectric barrier discharge for flexible displays

  • Gil, Elly (Department of Advanced Materials Science and Engineering, Sungkyunkwan University) ;
  • Lee, June-Hee (Department of Advanced Materials Science and Engineering, Sungkyunkwan University) ;
  • Kim, Yang-Su (Department of Advanced Materials Science and Engineering, Sungkyunkwan University) ;
  • Yeom, Geun-Young (Department of Advanced Materials Science and Engineering, Sungkyunkwan University)
  • Published : 2009.10.12

Abstract

Silicon dioxide ($SiO_2$) thin films were deposited using a modified DBD called a "pin-to-plate-type DBD" in order to generate high-density plasmas with a gas mixture of PDMS/$O_2$. The effect of the gas mixture on the physical and chemical properties of $SiO_2$ deposited by the pin-to-plate-type DBD with the mixture of PDMS/$O_2$ was investigated.

Keywords