전자소자의 축소화에 따라 electromigration은 점차 반도체 디바이스의 주요 결함 원 인으로 부각되고 있다. 본 실험은 현재 배선 재료로 널리 사용되고 있는 Al-1%Si 금속박막 배선의 electromigration에 대한 온도 및 배선길이 의존성에 관하여 연구하였다. ppLCC(pplastic Leaded Chipp Carrier) ppackage된 ppSG(8000$\AA$)/SiO2(1000$\AA$)/Al-1%Si(7000 $\AA$)/SiO2(5000$\AA$)/pp-typpe Si(100)의 보호막처리된 시편과 Al-1%Si/SiO2(5000$\AA$)/pp-typpe Si(100)의 보호막처리되지 않은 시편등을 standard pphotolithograpphy 공정을 이용하여 각각 제작하였다. 선폭 3$mu extrm{m}$, 길이 100, 400, 800, 1600$\mu\textrm{m}$의 등의 Al-1%Si 박막배선구조를 사용하 였다. 가속화실험을 위해 인가된 D.C 전류밀도는 4.5$\times$106A/cm2이었고 실온에서 10$0^{\circ}C$까지 의 분위기 온도에서 electromigration를 실행하였다. 박막배선길이에 따른 MTF(Mean Time-to-Failure)는 임계길이 이상에서 포화되는 경향을 보이며 임계길이는 Al-1%Si 박막 배선에서 분위기온도에 따라 길이 400$\mu\textrm{m}$과 800$\mu\textrm{m}$범위에서 나타났다. 각 시편에서 electromigration에 대한 활성화에너지도 MTF의 특성과 유사하게 임계길이 이상에서 포화 되는 특성을 타나내었다.

Seiko Seiki develops and munufactures magnetic Bearing type Turbomolecular Pumps (MB-TMP), Seiko shipped 14,000 MB-TMPs and holds the world's largest share in the MB-TMP field. It developed a new 300 (l/s) class turbomolecular pump.

약한 자장을 사용하는 평면형 유도 결합 플라즈마 식각 장치에서 라디카르이 농도 제어를 위하여 벽면온도를 증가시켜 라디칼 손실을 줄였다. 폴리머를 잘 형성하는 C4F8의 경우 이에 따라 식각 특성이 25%정도 개선되었고, OES(opptical emission sppectroscoppy)와 AMS(appearance mass sppectroscoppy)를 이용하여 라디칼과 이온의 밀도 변화를 측정하여 식각 결과를 설명할 수 있었으며, 반면에 CF4의 경우 큰변화를 볼 수 없었다.

Nitrogen implantation process has been applied for improvement of wear resistance of Z Zircaloy-4 fuel cladding materials. Nitrogen was implanted at 120 ke V to a total do range of 1xHP ions/cm2 to 8xlO17 ions/cm2 at various temperatures of 298"C to 676"C. The m microstructure changes by nitrogen implantation were analyzed by using TEM, XRD 뻐d A AES, cmd then wear behavior was evaluated by ball-on-disc wear testings at various loads a and sliding velocity under unlubricated condition. Nitrogen implantation produced ZrNx nitride above 4.37x1017 ions!cm2 as well as heavy d dislocations, which enhanced microhardness of the implanted surface of up to 900 Hk from 2 200 Hk of unimplanted substrate. Hardness was also found to be increased with increasing i implantation temperature and enhanced up to OOOHk at 620 "C. the wear resistance was g greatly improved with increasing total ion do않 as well as implantation temperature. The effective enhancement of wear resistance at high dose and tem야ratures is believed d due to significant hardening associated with high degree of precipitation of Zr nitrides and g generation of prismatic dislocation I$\infty$ps.infty$ps.

The Xu-Tec process is also called the double glow surface alloying technology and is a new method of surface metallurgy which can produce an alloy layers with sp ecial phisical and chemical properties on the surface of common and inexpensive mater ials. Many super alloys and alloy steels, sueh as nickel base alloys, high speed steels and staiinless steels, have been produced by Xu-Tee Process on the surfaces of carbon steels. The depth of the alloy lasyers may vary from several microns up to 300 micr ons with alloying elements in a concentration of few percentage to 100%. World wide patents for Xu-Tec process have been granted in the United states, Canada, United Ki ngdom, Australia and Japan. High performance saw blades have been successfully produced by the Xu-Tee process with much simper processing steps and less cost than bimetal high speed saw blades. A comparison of the cutting times and wear rates of the Xu-Tee blades with the conventional bimetal blades has been made. The Xu-Tee bIases demonstrates sim ilar or better performance than bimetal blades. A Xu-Tec Unit for the commercial pr oduction of Xu-Tec saw blades has been designed and manufactured. This Unit can t reat 10,000 haek saw blades at one time. Three Xu-Tec hack saw blades production I ines have been set up in China. China.