메탄을 원료가스로 하여 ppECVD에 의해 다이아몬드성 탄소(DLC) 박막을 형성하였 으며 이 때 인가전력의 크기 및 주파수 그리고 보조가스의 종류가 opptical band gapp의 크 기에 미치는 영향에 대하여 연구하였다. DLC 박막의 opptical band gapp은 증착되는 이온의 에너지가 증가할수록 감소하였으며, 불활성 기체를 보조가스로 사용하는 경우 인가전력에 따른 opptical band gapp의 크기가 큰 폭으로 심화되었다. 수소를 보조가스로 사용한 경우는 높은 인가전력(100W)에서 opptical band gapp이 증가하는 것으로 밝혀졌으며 본 연구에서 새로이 제안된 증착기구의 모델에 의해 적절한 설명이 가능하였다.

Relative intensities of photons emitted from tilted carbon foils have been measured in the wavelength region 300800 nm by 0,6-2,4 MeV $H^{+}\;and\;He^{+}$ ion impacts, Ions were directed onto target surfaces at tilt angles with respect to the sllrface normal, Experimental results support the model that the observed continuum radiation is emitted from the exited carbon foil itself. At each incident projectile energy, the photon intensities of continuum spectra for tilted carbon foi Is were compatred to the stoppi ng powers of carbon for $H^{+}\;and\;He^{+}$ ions, It was found that the photon emission intensity for $H^{+}$ ion is linearly proportional to the stopping power, whereas that for $He^{+}$ ions is proportional to a higher power of the stopping power, and that this tendency increases wi th decreasing velocity of the projectiIes[1, 2].[1, 2].

Totally dry lithography is studying with using plasma polymerized resist for almost 15 years. Recently organo-silicon ITlOnOmer was proposed as a new resist. When the plasma polymerized resist was irradiated through a mask in oxygen gas, the resist was oxidized and a fine pattern of submicron was successfully developed by $Cl_2$ gas plasma.